Table 2 Atomic concentration (%) of MC-copper after hydrogen plasma treatment through EDS bulk analysis
From: Application of low-temperature plasma for the removal of copper chloride layers on bronze Wares
Sample | Atomic percentages (%) | |
|---|---|---|
Cu / total metals | Cl / total metals | |
MC-copper-3 (CuCl, 3 min) | 95.4 ± 0.74 | 4.5 ± 0.74 |
MC-copper-5 (CuCl, 5 min) | 95.3 ± 2.53 | 4.6 ± 2.5 |
MC-copper-8 (CuCl, 8 min) | 96.4 ± 1.5 | 3.6 ± 1.46 |